Residual stress and texture in Aluminum doped Zinc Oxide layers deposited by reactive radio frequency magnetron sputtering

Publication date: Available online 12 December 2015
Source:Thin Solid Films
Author(s): C.L. Azanza Ricardo, M. Pastorelli, M. D'Incau, P. Aswath, P. Scardi
Aluminum doped Zinc Oxide thin films were deposited on standard soda-lime substrates by reactive radio frequency magnetron sputtering. Residual stress and texture were studied by X-ray diffraction, while X-ray Absorption Near Edge Spectroscopy provided information on the Al environment in the best performing thin films. The influence of deposition parameters on structural and microstructrual properties is discussed. A correlation between microstructure and residual stress state with electrical and optical properties is proposed.