Publication date: 1 May 2017
Source:Thin Solid Films, Volume 629
Author(s): M. Salhi, S.E.K. Abaidia, S. Mammeri, B. Bouaouina
By using a homemade dual magnetron sputtering system, two combined investigations by Optical emission spectroscopy and by Rutherford backscattering spectrometry were performed on a Radio-Frequency discharge for Titanium and Nickel deposited in pure Argon gas. Line intensities of various species present in the plasma were compared to the Argon emission line I of 696.5
Source:Thin Solid Films, Volume 629
Author(s): M. Salhi, S.E.K. Abaidia, S. Mammeri, B. Bouaouina