Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

Publication date: 1 April 2017
Source:Thin Solid Films, Volume 627
Author(s): Alla A. Pustovalova, Vladimir F. Pichugin, Nina M. Ivanova, Michael Bruns
N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character.