Publication date: 30 June 2017
Source:Thin Solid Films, Volume 632
Author(s): L. Skowronski, R. Szczesny, K. Zdunek
In this study, thin Al2 O3 , SnO2 and TiO2 films (37–582 O3 ) to 24.42 ). Atomic force microscopy measurements show that the thus prepared layers are very smooth. The results obtained using scanning electron microscopy and Raman spectroscopy techniques revealed their amorphous-like nature. Optical properties of the dielectrics were examined by means of spectroscopic ellipsometry and show the red-shift of their band-gap energy and lower values of the refractive index compared to corresponding values determined for dense films and/or bulk materials. The microstructural and optical properties of examined oxides are directly associated with specific growth conditions (the impulse injection of the reactive gas) in the pulse gas injection magnetron sputtering process carried out in the low pressure oxygen plasma.
Source:Thin Solid Films, Volume 632
Author(s): L. Skowronski, R. Szczesny, K. Zdunek
