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Thin films of n-type SnSe2 produced from chemically deposited p-type SnSe

Publication date: 1 January 2016
Source:Thin Solid Films, Volume 598
Author(s): Enue Barrios-Salgado, M.T.S. Nair, P.K. Nair
Tin(IV) selenide (SnSe2) thin films 120–280nm in thickness are obtained through heating SnSe films at 350°C, in the presence of Se-vapor. Thin film of SnSe deposited from a chemical bath is of orthorhombic crystal structure, with a band gap, E g , of 0.94eV, and p-type conductivity of 0.3Ω1 cm1. Thin film of SnSe2 280nm in thickness of hexagonal crystalline structure, with E g of 1.2eV and n-type electrical conductivity of 2Ω1 cm1 is produced from SnSe film 260nm in thickness. The SnSe2 film shows a Hall mobility of 10cm2/(Vs), carrier (electron) concentration 1017–1018 cm3 and thermoelectric power of −390μV/K. The thin film of SnSe2 formed this way is stable during further heating at temperatures up to 430°C, but it reverts to p-type SnSe thin film when heated at 530°C. Applications of these SnSe and SnSe2 thin films are considered.


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