Multi-structural TiO2 film synthesized by an atmospheric pressure plasma enhanced chemical vapour deposition microwave torch

Publication date: Available online 9 January 2016
Source:Thin Solid Films
Author(s): Y. Gazal, C. Dublanche-Tixier, C. Chazelas, M. Colas, P. Carles, P. Tristant
In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterization of the TiO2 films deposited in the optimized conditions revealed that both morphology and phase structure of the film are radial dependent. At the centre, the film is crystallized, exhibiting a well-defined columnar microstructure. Meanwhile, at the periphery, the film is amorphous, with a cauliflower-like structure.