Multi-structural TiO2 film synthesised by an atmospheric pressure plasma-enhanced chemical vapour deposition microwave torch

Publication date: 1 February 2016
Source:Thin Solid Films, Volume 600
Author(s): Y. Gazal, C. Dublanche-Tixier, C. Chazelas, M. Colas, P. Carles, P. Tristant
In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterisation of the TiO2 films deposited in the optimised conditions revealed that both morphology and phase structure of the film are radial dependent. At the centre, the film is crystallised, exhibiting a well-defined columnar microstructure. Meanwhile, at the periphery, the film is amorphous, with a cauliflower-like structure.