Growth of polycrystalline Pr2NiO4+δ coating on alumina substrate by RF magnetron co-sputtering from composite targets

Publication date: 1 February 2016
Source:Thin Solid Films, Volume 600
Author(s): A. Sediri, M. Zaghrioui, A. Barichard, C. Autret, B. Negulescu, L. Del Campo, P. Echegut, P. Laffez
Polycrystalline Pr2NiO4+δ coatings have been deposited on alumina substrates at room temperature by RF magnetron co-sputtering from Pr and Ni metallic composite target. The mixed target's area and the sputtering conditions were optimized to reach an atomic ratio Pr/Ni of 2. A subsequent annealing, at 1050–1100°C, allowed obtaining Pr2NiO4+δ phase after in situ high temperature x-ray diffraction study performed on as-deposited film. Microstructural analyses (SEM and AFM) revealed dense and rough microstructure. Normal spectral emittance measurements performed at 794 °C in the spectral range 400–5000cm^-1 showed an emissivity of ε≈0.8.