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Deposition and characterization of ZnO films using microplasma at atmospheric pressure

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Publication date: Available online 26 February 2016
Source:Thin Solid Films
Author(s): H.C. Thejaswini, B. Agasanapura, J. Hopwood
Zinc oxide (ZnO) films were deposited on room-temperature Si(100) by microwave-induced microplasma at one atmosphere. The precursor used in this work was zinc acetylacetonate hydrate (Zn(acac)2 .xH2O) sublimed at 54°C into flowing helium. The deposition rate was estimated to be 400nm/min. The films were visually transparent and FTIR spectroscopy confirms the presence of the Zn-O stretching vibration at 410cm1. Raman spectroscopy reveals that the films have the 437cm1 Raman band typical of a wurtzite crystal structure. Cross sectional scanning electron microscopy shows columnar growth with individual column widths of approximately 0.5μm. Scale-up using arrays of microplasmas is considered.


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