Publication date: 31 March 2016
Source:Thin Solid Films, Volume 603
Author(s): Z.G. Yuan, L. Sun, W.B. Gong, Z.L. Xu, X. Wu
Mo–Al–Si–N films were deposited on Si (100) wafers and hot working steel substrates by direct current magnetron sputtering using composite targets consisting of Mo, Al and Si. The chemical composition, crystalline microstructure, surface morphology and mechanical properties of films were investigated by energy dispersive spectroscopy, X-ray diffraction, field emission scanning electron microscopy, nanoindentation and wear test. The results indicate that Mo–Al–Si–N films are composed of grains with mixed crystallographic orientations. With increasing Si content from 0 to 18x phase and mixed crystallographic orientations. With increasing Si content from 0 to 29x phase.
Source:Thin Solid Films, Volume 603
Author(s): Z.G. Yuan, L. Sun, W.B. Gong, Z.L. Xu, X. Wu