Lateral growth of single-crystal Ge on insulating substrate using amorphous Si seed by rapid melting growth

Publication date: 31 December 2015
Source:Thin Solid Films, Volume 597
Author(s): Zhi Liu, Juanjuan Wen, Tianwei Zhou, Chunlai Xue, Yuhua Zuo, Chuanbo Li, Buwen Cheng, Qiming Wang
A rapid melting growth of Ge on insulating substrate was developed using amorphous Si seed. Spontaneous nucleation process and lateral growth process occurred at different annealing temperature. Single-crystal Ge stripes on the insulator substrate were obtained as the Ge stripe was dominated by the lateral growth process along the stripes. Different single-crystal Ge stripe has different orientation. No preferential orientation was observed. Spatial gradient of solidification temperature along the Ge stripes induced by Si–Ge mixing in seeding region is the key to cause lateral growth of Ge stripes. Saturation of Si concentration along the Ge stripes at higher annealing temperature was observed, which was explained by limited Si volume in the seeding region.