Publication date: 1 October 2016
Source:Thin Solid Films, Volume 616
Author(s): Magdalena Parlinska-Wojtan
A columnar TiAlSiN coating rich in Ti, deposited by cathodic arc evaporation PVD technique was subjected to a heat-treatment for 12 O3 /TiO2 structure, which was found to be the consequence of the high diffusion rate of Al at 1000x phase having an amorphous structure, as shown by HRTEM images, and resulted from the segregation of Si at grain boundaries and its oxidation during annealing.
Source:Thin Solid Films, Volume 616
Author(s): Magdalena Parlinska-Wojtan