Publication date: Available online 12 October 2016
Source:Thin Solid Films
Author(s): Syed M. Bukhari, Helmut Fritzsche, Zin Tun
We prepared CuNi (90/10) alloy thin films by D.C. magnetron sputtering on silicon substrates and investigated the film structure as a function of deposition time and sputtering power. The chemical composition (surface and bulk) and microstructure of these deposited films were studied by X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), X-ray Photoelectron Spectroscopy (XPS), and Neutron Reflectometry (NR). According to XRD studies, all deposited films were composed of single phase CuNi (90/10) alloy with the preferred orientation of the [111] direction along the surface normal. Grain sizes increased with the increase in deposition time and sputtering power. SEM and XPS studies confirmed a Stranski-Krastanov-type growth mode. Our XPS analysis revealed the existence of oxides on the surfaces of these films. Nickel was found to be present as NiO and Ni2 O3 . Furthermore, there was clear evidence for the existence of CuO along with Cu2 O. XPS and NR measurements confirmed the (90/10) alloy composition of our CuNi films.
Source:Thin Solid Films
Author(s): Syed M. Bukhari, Helmut Fritzsche, Zin Tun