Publication date: 1 December 2016
Source:Thin Solid Films, Volume 620
Author(s): Yong-Hoon Jeong, Han-Cheol Choe, William A Brantley
The purpose of this study was to investigate silicon-doped hydroxyapatite (HA) films deposited on Ti–35Nb–10Zr by an electrochemical and magnetron sputtering method. The Ti–35Nb–10Zr alloy was manufactured in an arc-melting furnace. Electrochemical deposition of HA was performed by pulsing the potential, using cyclic voltammetry, in the electrolyte composed of 53 )2 ·4H2 O4 H2 PO4 at 85
Source:Thin Solid Films, Volume 620
Author(s): Yong-Hoon Jeong, Han-Cheol Choe, William A Brantley
