Publication date: Available online 8 December 2016
Source:Thin Solid Films
Author(s): Yujun Shi
The reaction chemistry of four methyl-substituted silane molecules, including monomethylsilane (MMS), dimethylsilane (DMS), trimethylsilane (TriMS), and tetramethylsilane (TMS), has been studied in the hot-wire (catalytic) chemical vapor deposition (HWCVD) process, both on heated tungsten or tantalum filaments and in the gas phase. The four molecules dissociate catalytically on hot W or Ta surfaces to form ·CH3 , ·H and H2 . In a HWCVD reactor setup where the pressure is relatively high at 8–5333 bonds increases in the methyl-substituted silane molecules.
Source:Thin Solid Films
Author(s): Yujun Shi