Decomposition processes of photoresist polymers by H atoms produced on hot wire surfaces

Publication date: Available online 12 December 2016
Source:Thin Solid Films
Author(s): Hironobu Umemoto, Teruto Kato, Masayuki Takiguchi, Seiji Takagi, Hideo Horibe
Mass spectrometry was used to identify the decomposition products of two typical photoresist polymers, Novolak and polymethylmethacrylate, by H atoms produced on hot wire surfaces. The production of CH4 and CO was confirmed for both polymers. Other possible products are C3H8, C4H10 or C4H8, and some esters such as CH3COOC2H5. The production of CO2, C2H4, C2H6, alcohols, and aromatics are minor. The possible decomposition mechanisms are discussed on the basis of density functional calculations of the energetics.