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Effects of temperature and pressure on sulfurization of molybdenum nano-sheets for MoS2 synthesis

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Publication date: Available online 23 December 2016
Source:Thin Solid Films
Author(s): Rauf Shahzad, TaeWan Kim, Sang-Woo Kang
The synthesis of high-quality, thickness-controlled molybdenum disulfide (MoS2) films via vapor-phase growth remains a challenging process. In this work, the synthesis of two-dimensional (2D) MoS2 films via sputtering and sulfurization in a quartz tube furnace was investigated. Thicknesses of MoS2 films were dependent on the thickness of Mo films grown using sputtering. The Raman spectra of the MoS2 films exhibited a 19.12cm1 difference between two peaks, including in-plane vibration (E1 2g) and out-of-plane vibration (A1g), indicating a monolayer. Room temperature photoluminescence measurements indicate a peak spectral emission at 1.89eV. Surface morphology of multilayer MoS2 films and their crystallization processes were observed using atomic force microscopy and scanning electron microscopy. Low temperature (450°C) synthesis revealed a wide full width at half maximum (FWHM) of both modes, E1 2g and A1g, which indicates poor crystallinity. In contrast, using a high sulfurization temperature (750°C) results in a higher crystallinity or narrow FWHM. Film synthesis at the optimized process conditions (750°C and a pressure of 1KPa) produced continuous, uniform, and full-coverage films.


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