Publication date: 1 June 2017
Source:Thin Solid Films, Volume 631
Author(s): Yuki Hirata, Koeki Onishi, Junho Choi
In this study, a precursor gas mixture of toluene and Ar was used for the deposition of a-C:H films on a trench (20-mm pitch and 10-mm depth), and the effect of the Ar flow ratio on the film properties was investigated. The a-C:H films were deposited using a bipolar-type plasma based ion implantation and deposition technique under a negative pulse voltage of −
Source:Thin Solid Films, Volume 631
Author(s): Yuki Hirata, Koeki Onishi, Junho Choi