Investigation on the pure and fluorine doped vanadium oxide thin films deposited by spray pyrolysis method

Publication date: 1 May 2016
Source:Thin Solid Films, Volume 606
Author(s): Mudaliar Mahesh Margoni, S. Mathuri, K. Ramamurthi, R. Ramesh Babu, K. Sethuraman
Vanadium oxide and fluorine doped vanadium oxide thin films were deposited on the micro-slide glass substrates at 400°C by spray pyrolysis technique. Vanadium oxide films were deposited using 0.1M ammonium meta vanadate aqua solution. Precursor solution used to deposit fluorine doped vanadium oxide films was prepared adding separately 5wt.%, 10wt.%, 15wt.% and 20wt.% of ammonium fluoride with the 0.1M ammonium meta vanadate aqua solution. X-ray diffraction results showed that the films are in mixed phases of β-V2O5, V2O5 and V3O7. Surface morphology and band gap of these films were modified due to different levels of fluorine doping. The average visible transmittance (500–800nm) of vanadium oxide films is decreased due to low level concentration of fluorine doping.